最新刊期
      卷 0 ， 期 0 ， 2020
      • CAO Hui~1 HAO Yi~1 ZHANG Wenfeng~1 GAO Bo~1 TU Ganfeng~1 HAO Shengzhi~2 DONG Chuang~2 1
        Vol. 33, Issue 12, (2010)
        摘要：Wrought magnesium alloy AZ31 samples were bombarded by high current pulsed electron beam (HCPEB),so as to improve the material’s performance of sliding friction and wear resistance.The modified surface layer was characterized using optical microscope,scanning electron microscope and X-ray diffraction.Mechanical properties of microhardness and wear resistance were investigated in detail.The results show that the surface of HCPEB-treated samples melted completely and remained a stress in hundreds of MPa.Also,treated by pulses of increased numbers,microhardness of the sample surface increased in extended depths in hundreds of micrometers. After HCPEB treatment of 15 pulses,wear resistance of sample is 5.6 times greater than the virgin sample.  
        关键词：High current pulsed electron beam;Magnesium alloy;Surface treatment;Microhardness;Wear resistance   
        9
        |
        10
        |
        0
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7235367 false
        发布时间：2021-03-05
      • HAO Yi~1 GAO Bo~1 TU Ganfeng~1 LI Shiwei~1 HAO Shengzhi~2 LI Mincai~2 DONG Chuang~2 1
        Vol. 33, Issue 12, (2010)
        摘要：In the paper,hypereutectic Al-25Si alloy specimens are treated by HCPEB(high current pulsed electron beam) and their microstructure morphology,phase transformation and corrosion resistance are characterized.The results show that grains of the Al-25Si alloy surface are significantly refined owing to rapid melting and solidification during the HCPEB bombardment process.Coarse primary Si melts and Si element dissolves into Al matrix,hence the chemical composition of Al-25Si surface tends to homogenous distribution.Cross-section analysis indicates that remelted layer with high relative density has an obvious boundary with matrix and the thickness of remelted layer is 8-9μm.In the weight-loss experiment,corrosion weigh loss of HCPEB-treated Al-25Si alloy is reduced by 0.008 g and corrosion rate is decreased 12.1%in 3.5wt%NaCl solution.In summary,the microstructure and corrosion resistance of Al-25Si alloy treated by HCPEB are significantly improved.  
        关键词：High current pulsed electron beam;Al-25Si;Microstructure;Corrosion resistance   
        15
        |
        35
        |
        2
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7234667 false
        发布时间：2021-03-05
      • LIU Chuansheng~1 LI Ming~1 HE Jun~1 YANG Zheng~1 ZHOU Lin~1 WANG Zesong~1 GUO Liping~1 JIANG Changzhong~1 YANG Shibo~1 LIU Jiarui~2 Lee J C~3 FU DeJun~1 FAN Xiangjun~1 1
        Vol. 33, Issue 12, (2010)
        摘要：An accelerator-TEM interface facility has been established at Wuhan University in 2008.The system consists of an H800 TEM linked to a 200 kV ion implanter and a 2×1.7 MV tandem accelerator.Nitrogen ions at 115 keV were successfully transported from the implanter into the TEM chamber through the interface system,and the ion currents measured at the entrance of the TEM column were between 20 and 180 nA.Structural evolution caused by ion irradiation in Si,GaAs,nanocrystal Ag was observed in situ.The in situ observation showed that the critical implantation dose for amorphization of Si is 1014 cm-2.The nuclear material C276 samples implanted with 115 keV Ar+ was also studied,and dislocation loops sized at 3-12 nm were clearly observed after implantation to doses of over 1×1015 cm2.The density of the loops increased with the dose.Evolution to polycrystalline and amorphous structures were observed at 5×l015 cm-2 and 3×1016 cm2,respectively.An in situ RBS/C chamber was installed on the transport line of the accelerator-TEM interface system.This enables in situ measurement of composition and location of the implanted species in lattice of the samples.In addition,a 50 kV low-energy gaseous ion generator was installed close to the TEM chamber,which facilitates in situ TEM observation of helium bubbles formed in helium-implanted materials.  
        关键词：Accelerator;Ion implanter;Electron microscopy;Interface system;Ion transport line   
        10
        |
        12
        |
        0
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7234377 false
        发布时间：2021-03-05
      • HAN Zhaolei~
        Vol. 33, Issue 12, (2010)
        摘要：Polyethersulfone(PES) microporous membrane was grafted with methacryhc acid under electron beam irradiation.Controlling the monomer concentration or the absorbed dose,the relationships of the degree of grafting with the monomer concentration and the absorbed dose were obtained for optimum the monomer concentration and absorbed dose.The grafted membrane was characterized by FT-IR and SEM,and the hydrophihcity contact angle of the membrane was tested.  
        关键词：Electron beam;Simultaneous irradiation;Grafting modification;Hydrophilicity;Polyethersulfone;Methacrylic acid   
        9
        |
        11
        |
        0
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7234274 false
        发布时间：2021-03-05
      • LIANG Hong~
        Vol. 33, Issue 12, (2010)
        摘要：Dense and highly ordered TiO2 nanotube arrays（TiNT） were fabricated by electrochemical anodic oxidation method,and doped with Zn by MEWA ion implantation.The surface morphology was characterized by scanning electron microscope.Photoelectric efficiency of the doped TiNT samples under UV and visible light excitation was studied.Theoretical study of anatase TiO2 doped with Zn was carried out by the LAPW method based on density functional theory.  
        关键词：Titania nanotube;Zn implantation;Photoelectric efficiency   
        9
        |
        10
        |
        0
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7234261 false
        发布时间：2021-03-05
      • PANG Enjing~1 ZHUYing~1 LI Fen~1 LI Liuhe~1 LUQiuyuan~2 Paul KChu~2 1
        Vol. 33, Issue 12, (2010)
        摘要：In magnetron sputtering,the magnetic field determines the sputtering stability,ionization rate,target utilization coefficient and films quality.Reasonable magnetic field distribution leads to a glow discharge distribution of desirable uniformity,hence improved target sputtering rate at different areas,extended sputtering area,prolonged target life and increased stability of the sputtering process.In this paper,the magnetic field of a hexagon target system is optimized by finite element method,and this provides a theoretic basis for optimization of the magnetron sputtering system.  
        关键词：Magnetic field;Multi-target;Finite element simulation   
        10
        |
        11
        |
        0
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7233223 false
        发布时间：2021-03-05
      • LI Shuqing GONG Shuili LI Qilian
        Vol. 33, Issue 12, (2010)
        摘要：In this paper,WC-10Co4Cr coatings were deposited by the laser hybrid plasma spraying(LHPS) technology on 38CrMoAl substrates.Microstructure and tribological properties of the coatings were studied using optical microscopy,X-ray diffraction,scanning electron microscope,SRV friction and wear testing.The results indicated that the microstructures and properties of the laser hybrid plasma spraying WC-10Co4Cr coatings changed with the laser power.When the laser power was 2100-2500 W,the coating had good adherence with the substrate, compact microstructures,high bonding strength,low friction coefficient and good anti-wear performance.The wear mechanism of the LHPS WC-10Co4Cr coating is mild scratching and plastic deformation.  
        关键词：Laser hybrid plasma spraying;WC-10Co4Cr coating;Performances   
        11
        |
        12
        |
        1
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7233241 false
        发布时间：2021-03-05
      • JIN Jie QIU Weiwei WANG Jinhui GUO Huibin
        Vol. 33, Issue 12, (2010)
        摘要：Using ion beam composite deposition method Magnetron sputtering deposition,soft metal solid lubricant of Ag film was grown on 9Crl8 steel substrate.The microstructures and friction properties were measured by means of the hundred cell knife scratch method,MS-T3000 multi-meter friction and wear testing and scanning electron microscopy.The results showed that compared with the magnetron sputtering method,a transition layer bonded with chemical metallurgy and mechanical engagement is formed after ion beam composite deposition.The transition layer can be attributed to the strong adhesion between the film and the substrate.  
        关键词：Friction and wear;Ag films;Magnetron sputtering;Ion source;Solid lubricant films   
        9
        |
        12
        |
        2
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7234291 false
        发布时间：2021-03-05
      • ZHUZongtao GUI Gang WANG Zhijian GONG Chunzhi YANG Shiqin TIANXiubo
        Vol. 33, Issue 12, (2010)
        摘要：During plasma immersion ion implantation(PHI) processes,due to the capacitance effect of the coaxial cable and plasma load,the output voltage pulse of high-voltage modulator possesses a longer leading- and trailing-edge time.The leading- and trailing-edge of the high voltage(HV) pulse have a critical effect on the ion-energy uniformity,depth and dose distribution during PHI processes.In this work,a tetrode was used as a hard tube to switch the DC high voltage,and a HV pulse modulator with a maximum pulse voltage of 40 kV was built successfully.The effect of the trailing-edge time on the implantation uniformity was simulated by one-dimension PIC method.The potential on the control grids of the tetrode was optimized to obtain a HV pulse with a short rise time.In our system,200 V potential on grid one is utilized and the leading-edge time of pulse can be as small as 1 us.The IGBTs in series was utilized to release the remnant charges reserved in the equivalent capacitance of the plasma load and coaxial cable.Thus the trailing-edge time of the HV pulse could be reduced.The effect of the driver signals with different delay time and the absorption parameters of each IGBTs were simulated by PSPICE software to optimize the design the electric circuit.  
        关键词：Plasma ion implantation;High voltage pulse power supply;Steep pulse;Ion implantation uniformity   
        10
        |
        11
        |
        0
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7234847 false
        发布时间：2021-03-05
      • LUANXiting~1 DENG Yongfeng~2 TAN Chang~2 HAN Xianwei~2 MAO Genwang~1 1
        Vol. 33, Issue 12, (2010)
        摘要：Based on Geant4 Monte Carlo toolkit,a numerical model is established to simulate the electron beam transportation characteristics under low-vacuum condition.The results indicate that the low-vacuum transportation characteristics differ greatly from the high-vacuum case.The residual gas affects the beam trajectory greatly,but the magnetic field can focus the beam effectively.The final trajectory is determined by both effects.For a given magnetic field,in order to get the desired beam,the beam energy should be in a reasonable range.  
        关键词：Electron beam;Transportation characteristics;Monte Carlo   
        12
        |
        13
        |
        0
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7234516 false
        发布时间：2021-03-05
      • FENG Zhe~1 ZHANG Xiaozhang~1 LIU Zhanwen~2 ZHAO Hongwei~2 1
        Vol. 33, Issue 12, (2010)
        摘要：In this study,we use the optical emission spectrum（OES） method to determine the electron density of H2 plasma produced by contiguous ECR microwave heating and restricted by an axial magnetic field that produced by an all-permanent-magnet design（NdFeB rings）.The H+ density obtained is about 1010-1011 cm-3 under 200-700 W of the microwave and 0-2 Pa of the gas pressure.The intensity of Balmer lines of hydrogen atoms in excitation state varies with microwave power and gas pressure.  
          
        10
        |
        11
        |
        0
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7234415 false
        发布时间：2021-03-05
      • CHEN Lihua CUI Baoqun MA Ruigang ZHENG Yongnan JIANG Chong MA Yingjun HUANG Qinghua JIANG Weisheng
        Vol. 33, Issue 12, (2010)
        摘要：In this paper,we report a H2+/He+ ion implanter developed at CIAE,aiming at producing 200 keV H2+ and He+ beams simultaneously.The ion optics,ion source,electronics and mechanical designs are described in detail.Ion ratio of the beams can be adjusted to meet the requirements of experiment.Test results show that the H2+/He+ ion implanter works reliably and specifications of the design are achieved.  
        关键词：Ion implanter;Lens;Ion source;Mass spectrum   
        10
        |
        12
        |
        0
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7234303 false
        发布时间：2021-03-05
      • GONG Zhiyu~1 YAN Sha~1 MA Hongji~2 NIERui~2 XUE Jianming~1 WANG Yugang~1 1
        Vol. 33, Issue 12, (2010)
        摘要：A novel ion beam focusing technique,tapered glass capillary,has interested many groups.Compared to conventional way of obtaining micro ion beams,its advantages are cheap,simple compacted,and convenient. However,mechanisms of the tapered glass capillary in focusing MeV ions are not clear yet.In this work,2 MeV He~+ ion microbeams were obtained with tapered glass capillaries in outlet diameter of 35,75 and 110μm.The current intensity,beam crosssection,and energy spectra were measured at various tilt angles of the capillary.The results suggested that the MeV ions outgoing from capillary outlet might undertake at least two of three kinds of interactions: deflection by the electrical field of statistic charges deposited on the capillary wall,small angle scattering by continuously surface potential,and small angle Rutherford scattering.  
        关键词：Micro ion beam;Glass capillary;Ion beam focusing   
        9
        |
        13
        |
        0
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7234872 false
        发布时间：2021-03-05
      • HE Pingni~
        Vol. 33, Issue 12, (2010)
        摘要：In this study,molecular dynamics simulations were performed to investigate temperature effects of SiF3+ bombarding SiC surfaces at the incident energy of 150 eV.The improved Tersoff-Brenner type potential energy function for the Si-C-F system was chosen.The simulation results show that all incident SiF3+ dissociate and most dissociated products deposit on the surface.A SixCyFz reactive layer is formed by SiF3+ continuously bombarding. The etch yield of Si atoms is higher than that of C atoms in SiC.This is in good agreement with experimental data. When etching of C and Si reaches steady state at 300,500,700 and 900 K,the etching yields of Si are about 0.061, 0.080,0.085 and 0.104,respectively,and the etching yields of C are about 0.019,0.030,0.034 and 0.039,respectively. In the etching products,SiF2 species are dominant Si-containing products,and SixFyCz is dominant C-containing products.Most etching products are produced by chemical-enhanced physical sputtering.  
        关键词：Molecular dynamics;SiF3- etching SiC;Molecular dynamics simulation;SiC;MEMS   
        14
        |
        11
        |
        0
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7234448 false
        发布时间：2021-03-05
      • MU Xiaodong MU Zongxin WANG Chun ZANG Hairong LIU Bingbing DONG Chuang
        Vol. 33, Issue 12, (2010)
        摘要：As a new deposition technology providing high ionization rate of sputtering materials and depositing dense films of high performance,the high-power pulsed magnetron sputtering(HPPMS) technology has been investigated in many countries.In this work,we prepared a series of CrN_x films using high-power pulsed unbalanced magnetron sputtering(HPPUMS) technology.Morphology and microstructure of the films in different thickness were characterized with AFM and XRD.The film thickness and hardness were measured.Tribological performance of the films was tested and compared with films prepared by middle-frequency magnetron sputtering(MFMS).The results show that HPPUMS technology is able to deposit CrN_x films of higher hardness,higher bonding strength and lower coefficient of friction.  
        关键词：Films;Vapor deposition;Pulsed power;CrN_x;Hardness   
        10
        |
        11
        |
        1
        <HTML>
        <L-PDF><Meta-XML>
        <引用本文> <批量引用> 7234431 false
        发布时间：2021-03-05
      0