A 200 keV H2+/He+ ion implanter

CHEN Lihua CUI Baoqun MA Ruigang ZHENG Yongnan JIANG Chong MA Yingjun HUANG Qinghua JIANG Weisheng

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A 200 keV H₂⁺/He⁺ ion implanter

更新时间：2021-03-05

- A 200 keV H₂⁺/He⁺ ion implanter
- NUCLEAR TECHNIQUES Vol. 33, Issue 12, (2010)
- 作者机构：
  
  中国原子能科学研究院
- 作者简介：
- 基金信息：
  
  973项目——ADS资助
- DOI：
  CLC： TL503.3
- Published：01 December 2010
- 稿件说明：
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[1]陈立华,崔保群,马瑞刚,郑永男,姜冲,马鹰俊,黄青华,蒋渭生.氢氦离子注入机的研制[J].核技术,2010,33(12):937-940.

CHEN Lihua CUI Baoqun MA Ruigang ZHENG Yongnan JIANG Chong MA Yingjun HUANG Qinghua JIANG Weisheng. A 200 keV H₂⁺/He⁺ ion implanter[J]. Nuclear techniques, 2010, 33(12): 937-940.
[1]陈立华,崔保群,马瑞刚,郑永男,姜冲,马鹰俊,黄青华,蒋渭生.氢氦离子注入机的研制[J].核技术,2010,33(12):937-940. DOI：

CHEN Lihua CUI Baoqun MA Ruigang ZHENG Yongnan JIANG Chong MA Yingjun HUANG Qinghua JIANG Weisheng. A 200 keV H₂⁺/He⁺ ion implanter[J]. Nuclear techniques, 2010, 33(12): 937-940. DOI：

摘要

本文介绍了正研制的氢氦离子注入机的结构和各部分的主要性能指标。它的最高能量为200 keV

可按一定比例同时用氢氦两种离子进行注入实验。该机经调试

各项主要指标已达设计要求

工作稳定可靠。

Abstract

In this paper

we report a H

/He

ion implanter developed at CIAE

aiming at producing 200 keV H

and He

beams simultaneously.The ion optics

ion source

electronics and mechanical designs are described in detail.Ion ratio of the beams can be adjusted to meet the requirements of experiment.Test results show that the H

/He

ion implanter works reliably and specifications of the design are achieved.

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Related Author

Accelerator Laboratory of Beijing Machinery-Electricity Institute

Yongjian XU

Li ZHANG

Yahong XIE

Caichao JIANG

Lizhen LIANG

Chundong HU

Le ZHENG

Related Institution

Institute of Plasma Physics, Chinese Academy of Sciences

University of Science and Technology of China

Institute of Fluid Physics, China Academy of Engineering Physics

Quantum-Functional Semiconductor Research Center Dongguk University

Wuhan University,Wuhan 430072,China) 2

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