Study on deposition and properties of CrN_x films by high power pulsed unbalanced magnetron sputtering

MU Xiaodong MU Zongxin WANG Chun ZANG Hairong LIU Bingbing DONG Chuang

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Study on deposition and properties of CrN_x films by high power pulsed unbalanced magnetron sputtering

更新时间：2021-03-05

- Study on deposition and properties of CrN_x films by high power pulsed unbalanced magnetron sputtering
- NUCLEAR TECHNIQUES Vol. 33, Issue 12, (2010)
- 作者机构：
  
  三束材料改性教育部重点实验室大连理工大学物理与光电工程学院
- 作者简介：
- 基金信息：
  
  国家自然科学基金(50407015);辽宁省教育厅科研项目资助
- DOI：
  CLC： O484.1
- Published：01 December 2010
- 稿件说明：
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[1]牟晓东,牟宗信,王春,臧海荣,刘冰冰,董闯.高功率脉冲非平衡磁控溅射制备CrN_x薄膜及其性能研究[J].核技术,2010,33(12):951-954.

MU Xiaodong MU Zongxin WANG Chun ZANG Hairong LIU Bingbing DONG Chuang. Study on deposition and properties of CrN_x films by high power pulsed unbalanced magnetron sputtering[J]. Nuclear techniques, 2010, 33(12): 951-954.
[1]牟晓东,牟宗信,王春,臧海荣,刘冰冰,董闯.高功率脉冲非平衡磁控溅射制备CrN_x薄膜及其性能研究[J].核技术,2010,33(12):951-954. DOI：

MU Xiaodong MU Zongxin WANG Chun ZANG Hairong LIU Bingbing DONG Chuang. Study on deposition and properties of CrN_x films by high power pulsed unbalanced magnetron sputtering[J]. Nuclear techniques, 2010, 33(12): 951-954. DOI：

摘要

高功率脉冲磁控溅射技术（HPPMS）溅射粒子离化率高

可沉积致密、高性能薄膜

作为一种新技术在国外广泛研究。本文用高功率脉冲非平衡磁控溅射技术（HPPUMS）制备一系列CrN

薄膜

采用原子力显微镜（AFM）和X射线衍射（XRD）对不同厚度的薄膜表面形貌、微观结构进行了分析

测定了薄膜的厚度和硬度

研究了薄膜的摩擦学性能

并与中频磁控溅射（MFMS）技术制备的CrN

进行比较。结果表明

使用高功率脉冲非平衡磁控溅射技术（HPPUMS）能制备致密的CrN

薄膜。薄膜有较好的综合性能

有较高硬度、较高结合强度和低摩擦系数。

Abstract

As a new deposition technology providing high ionization rate of sputtering materials and depositing dense films of high performance

the high-power pulsed magnetron sputtering(HPPMS) technology has been investigated in many countries.In this work

we prepared a series of CrN_x films using high-power pulsed unbalanced magnetron sputtering(HPPUMS) technology.Morphology and microstructure of the films in different thickness were characterized with AFM and XRD.The film thickness and hardness were measured.Tribological performance of the films was tested and compared with films prepared by middle-frequency magnetron sputtering(MFMS).The results show that HPPUMS technology is able to deposit CrN_x films of higher hardness

higher bonding strength and lower coefficient of friction.

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