Optimal design of the magnetic field in a multi-target magnetron sputtering system

PANG Enjing~1 ZHUYing~1 LI Fen~1 LI Liuhe~1 LUQiuyuan~2 Paul KChu~2 1

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Optimal design of the magnetic field in a multi-target magnetron sputtering system

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- Optimal design of the magnetic field in a multi-target magnetron sputtering system
- NUCLEAR TECHNIQUES Vol. 33, Issue 12, (2010)
- 作者机构：
  
  1. 北京航空航天大学机械工程及自动化学院材料加工与控制系
  2. 香港城市大学物理及材料科学系
- 作者简介：
- 基金信息：
  
  国家自然科学基金(10775013,11075012);教育部新世纪优秀人才支持计划;“中央高校基本科研业务费”专项资金(YWF-10-01-A07)资助
- DOI：
  CLC： TB43
- Published：01 December 2010
- 稿件说明：
移动端阅览
[1]庞恩敬,朱颖,李芬,李刘合,卢求元,朱剑豪.多靶磁控溅射系统磁场优化设计[J].核技术,2010,33(12):908-912.

PANG Enjing~1 ZHUYing~1 LI Fen~1 LI Liuhe~1 LUQiuyuan~2 Paul KChu~2 1. Optimal design of the magnetic field in a multi-target magnetron sputtering system[J]. Nuclear techniques, 2010, 33(12): 908-912.
[1]庞恩敬,朱颖,李芬,李刘合,卢求元,朱剑豪.多靶磁控溅射系统磁场优化设计[J].核技术,2010,33(12):908-912. DOI：

PANG Enjing~1 ZHUYing~1 LI Fen~1 LI Liuhe~1 LUQiuyuan~2 Paul KChu~2 1. Optimal design of the magnetic field in a multi-target magnetron sputtering system[J]. Nuclear techniques, 2010, 33(12): 908-912. DOI：

摘要

磁场分布对磁控溅射稳定性、离化率、靶材利用率及成膜质量都有重要影响

合理分布可使靶材附近等离子体分布均匀

不同位置溅射速率差减小

靶材刻蚀范围增大

靶材寿命延长

溅射过程稳定性提高。本文针对六靶复合表面改性设备

用有限元法对磁场进行模拟

得到较理想的磁场分布

为优化设计提供理论依据。

Abstract

In magnetron sputtering

the magnetic field determines the sputtering stability

ionization rate

target utilization coefficient and films quality.Reasonable magnetic field distribution leads to a glow discharge distribution of desirable uniformity

hence improved target sputtering rate at different areas

extended sputtering area

prolonged target life and increased stability of the sputtering process.In this paper

the magnetic field of a hexagon target system is optimized by finite element method

and this provides a theoretic basis for optimization of the magnetron sputtering system.

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