SUN Liangting ZHANG Zimin ZHAO Hongwei ZHANG Xuezhen GUO Xiaohong CAO Yun
Issue 9, (2002)
摘要:A new ECR (Electron Cyclotron Resonance) ion source with double RF heating was constructed in Lanzhou this year. The main purpose of this source is to provide highly charged ion beams for atomic physics and surface physics research. The design of this ion source is based on the IMP 14.5GHz ECR ion source (LECR2-Lanzhou Electron Cyclotron Resonance ion source No.2) with double RF heating by inserting waveguide directly and aluminium chamber. Furthermore, the volume of the plasma chamber is larger than that of LECR2 so as to increase the RF power and improve beam intensity for highly charged ions. But the hexapole field on the chamber wall is kept the same value in order to compare with the performance of LECR2. After only four days conditioning the first test results were obtained. The final result of this ion source is expected better than LECR2’s.
关键词:ECR ion source;Double RF heating;High charge state
YOU Dawei 1 LI Anjie 1 JIANG Jianguo 2 WU Jianjun 1 HUANG Xiaogang 1 1
Issue 9, (2002)
摘要:The IAD technology (Ion assisted deposition) attractes more attention recently because of the advantages. The Hall accelerator for IAD was developed. It has small size ( 6cm), low energy (average energy 40-150eV), high beam current (200-1000mA), large uniformity (the uniform area > 50cm) and the compact construction. The design of the Hall accelerator and the optimum magnetic structure were presented. The permanent magnet was applied. The pole pieces were arranged to obtain the divergent magnetism and strong magnetism gradient along axial direction. The design gives us good results. The high discharge efficiency and low neutral loss were obtained. The Hall acceralater can work in low pressure 1×10 -2 -2×10 -2 Pa, low flowrates 5-10 SCCM stably.
TONG Honghui CHEN Qinchuan HUO Yanfeng WANG Ke MU Lilan FENG Tiemin ZHAO Jun YAN Bing GENG Man
Issue 9, (2002)
摘要:A new generation industrial plasma immersion ion implanter was developed recently in Southwestern Institute of Physics and some experimental results are reported in this paper. The vacuum chamber with 900 mm in diameter and 1050 mm in height stands vertically. The pumping system includes turbo-pump and mechanical pump and it can be automatically controlled by PLC. The background pressure is less than 4×10 -4 Pa. The plasma in the chamber can be generated by hot-filament discharge and three high-efficiency magnetic filter metal plasma sources, so that the plasma immersion ion implantation and enhanced deposition can be done. The maximum pulse voltage output is 80kV, maximum pulse current is 60A, repetition frequency is 50-500Hz, and the pulse rise time is less than 2μs. The power modulator can operate in the pulse bunching mode if necessary. In general, the plasma density is 10 8-10 10 cm -3 , the film deposition rate is 0.1-0.5nm/s?
关键词:Plasma immersion ion implantation;Enhanced film deposition;Metal plasma source;Surface modification of material
TANG Baoyin WANG Langping WANG Xiaofeng GAN Kongyin WANG Songyan
Issue 9, (2002)
摘要:The third generation multi-purpose plasma immersion ion implantation (PIII) equipment has been successfully used for research and development of surface modification of biomedical materials, metals and their alloys in the Southwest Jiaotong University. The implanter equipped with intense current, pulsed cathodic arc metal plasma sources which have both strong coating function and gas and metal ion implantation function. Its pulse high voltage power supply can provide big output current. It can acquire very good implantation dose uniformity. The equipment can both perform ion implantation and combine ion implantation with sputtering deposition and coating to form many kinds of synthetic surface modification techniques. The main design principles, features of important components and achievement of research works in recent time have been described in this paper.
关键词:Plasma immersion ion implantation;Surface modification of materials;Intense current pulsed cathodic arc metal plasma sources;Metal plasma immersion ion implantation and deposition
摘要:A high dense metal plasma can be produced by using cathodic vacuum arc discharge technique. The microparticles emitted from the cathode in the metal plasma can be removed when the metal plasma passes through the magnetic filter. It is a new technique for making high quality, fine and close thin films which have very widespread applications. In this paper we describe the applications of cathodic vacuum arc technique, and then a filtered plasma deposition and ion implantation system as well as its applications.
摘要:A cluster machine which can produce cluster of different size by adjusting evaporation or sputtering parameter is introduced here. It is shown the novel properties of those cluster films and its applications in optical and magnetic films.
摘要:Dynamic characteristics of initial process of gas ionization by explosive electrons emitted from the cathode have been simulated by using particle-in-cell MAGIC code and based on the models of the cathode explosive electron emission and the neutral gas ionization. The profiles of space and phase space, and the histograms of velocity for electrons and protons in the gap, as well as the total charge density along the symmetrical axis direction are presented at a hydrogen pressure of 1.33×10 -2 Pa and an applied voltage of 10kV, respectively. The initial processes of electron emission and gas discharge as well as behavior of particles were analyzed. The results also showed that the maximum velocity of electrons and protons are 5.8×10 7m/s and 1.3×10 6m/s, respectively.
摘要:Plasma immersion ion implantation is a new technique pertaining to ion implantation. Different from the case of exterior surface treatment, plasma immersion ion implantation of interior surface possesses dimension effects. Consequently it is a challenge to implant the inner wall of a cylindrical bore due to this finite dimension. The ion energy cannot be linearly changed with applied voltage and there exists a saturation value due to overlap effect of plasma sheath. The plasma in the bore may rapidly be depleted, which is attributed to finite plasma volume and plasma-sheath conflowing effect. For instance the plasma depletion time is about 0.55 μs when a bore with a diameter of 20cm is treated under conditions of applied voltage of 30kV and plasma density of 2×10 15 ions/cm 3. Interior plasma-source hardware may be an effective solution.
关键词:Inner surface;Plasma immersion ion implantation;Dimension effects
QIU Aici ZHANG Jiasheng PENG Jianchang YANG Hailiang HE Xiaoping SHI Lei TANG Junping ZHOU Nan DING Sheng NIU Shengli
Issue 9, (2002)
摘要:In this paper the progress in studying the generation of high power pulsed ion beams for simulating Planck-spectrum X-ray thermal-mechanical effects on the material is presented. Theoretical parameters of pulsed proton beam corresponding 1keV X-ray thermal-mechanical effects on the malerial are calculated. The experimental results of generating high power pulsed ion beams with pinch-diode, as well as 50kA pulsed proton beams generated on FLASH-Ⅱ accelerator are introduced
关键词:High power pulsed ion beam;Pinched diode;Pulsed electron beam;Accelerator;Thermal-mechanical effect
YANG Hailiang QIU Aici ZHANG Jiasheng HUANG Jianjun SUN Jianfeng
Issue 9, (2002)
摘要:The electron incident angles have a heavy effect on the intense pulsed electron beam current transmission fraction and energy deposition in material. The electron beam incident angle can be determined by measuring beam current transmission fraction using Rogowskii coils, thereby determining energy deposition of electron beam current in material. The electron beam current transmission fraction and energy deposition in carbon versus electron energy (0.4-1.4 MeV), at various electron incident angles for three thicknesses of carbon target by using theoretical calculation are introduced. The calculation results indicate that the electron beam current transmission fraction decreases as the electron beam incident angle increasing and electron beam with low incident angle (closer to normal incidence) penetrates much deeply into the target material. 1.0-1.4MeV electron beam deposited the most energy in material at 60°-70° incident angle.
关键词:Electron beam;Electron incident angles;Electron transport;Beam current transmission fraction;Energy deposition;Carbon target
QIN Jiuchang JIANG Yongliang YOU Qubo BAI Xixiang LIU Weiping CHEN Quan GUO Gang HE Ming JIANG Shan XU Jincheng
Issue 9, (2002)
摘要:The secondary radioactive nuclear beam line was developed and RNB 11 C, 17 F, 7Be, 13 N, 6He were obtained from the beam line. Using 7Be, measurement of angle distribution of 7Be(d,n) 8B reaction was completed. Off-line method was used to produce and accelerate RNB 64 Cu on the HI-13 Tandem Accelerator with 64 Cu of 1.2×10 5 ions·s -1 (80MeV) on the experimental target. Experimental study of 64 Cu Coulomb excitation has been done.
摘要:A ns pulsed system for high current beam employed in CIAE600kV ns Pulse Neutron Generator was established. Its characteristic, main technological performance and applications were also introduced.
SHEN Yixiong SHEN Dingyu LU Xiting JIANG Dongxing WANG Xuemei NIE Rui
Issue 9, (2002)
摘要:The production and identification of MeV/atom cluster beams at 2×1.7MV accelerator in Peking University are introduced in this paper. The vicinage effect, i.e. radiation damage in crystalline silicon and interaction mechanism of MeV/atom cluster with solids are investigated.
关键词:MeV atomic cluster beams;Production;Identification;Interaction with solids
HU Suhua WU Yu CHEN Bin LI Jun ZHANG Shuqing WU Lijun WANG Shaohu YU Zengliang
Issue 9, (2002)
摘要:The research progress and development goals of a new kind of instrument which is called single-ion microbeam equipment are introduced in this paper. Particles from this kind of equipment can be implanted into cells in micrometer-radius for radio-biological experiments.
摘要:The structure, main technical parameters and characteristics of the precision numerical controlled high vacuum electron beam welding machine are introduced. The design principle, some features and solutions to some key technique problems of this new type machine are described.
HE Chengdan 1,2 CHENG Yongjun 1 YING Lei 1 XU Qijin 1 1
Issue 9, (2002)
摘要:Local vacuum electron beam welding and its application prospect in military and civil industry are introduced in this paper. A home made local vacuum electron beam welding is completed. Its main technical parameters and key techniques are also presented
关键词:Local vacuum;Electron beam welding;Flange rim;Dynamic seal
LIU Zhihua LEI Xuefeng ZHAO Bing ZHAO Zenghui ZHAO Qing
Issue 9, (2002)
摘要:An experiment on vacuum electron beam welding procedure for typical aluminum alloy workpiece with flange circumferential weld was introduced in detail in this paper. The reason of porosity produced when welding aluminum alloy is analyzed and some corresponding processing are taken to achieve welding with good quality.
WU Aimin 1 LIU Hanwei 2 ZOU Jianxin 1 ZHOU Zhongrong 2 DONG Chuang 1 1
Issue 9, (2002)
摘要:This paper studied the effect of high current pulsed electron beam (HCPEB) treatment on fretting wear ability of D2 die steel. It is shown that the most pronounced structural changes occur in the near-surface region, where the energy deposition is at its maximum. The fretting tests under dry condition were carried out on both treated and untreated specimens. The HCPEB treatment increases the fretting wear resistance significantly, and the improvement is further enhanced by surface pre-alloying by TiN and Cr. SEM analysis of the wear scars showed that the fretting wear mechanism of Cr coating is adhesive and oxidation wear, that of the TiN coating and non-coating D2 die steel is particle detachment through the propagation and fracture of fatigue microcracks on surface, and slight adhesive and oxidation wear is found, its wear mechanism is more complex.
关键词:High current pulsed electron beam;Die steel;Surface modification;Fretting wear