A new generation industrial plasma immersion ion implanter was developed recently in Southwestern Institute of Physics and some experimental results are reported in this paper. The vacuum chamber with 900 mm in diameter and 1050 mm in height stands vertically. The pumping system includes turbo-pump and mechanical pump and it can be automatically controlled by PLC. The background pressure is less than 4×10 -4 Pa. The plasma in the chamber can be generated by hot-filament discharge and three high-efficiency magnetic filter metal plasma sources

so that the plasma immersion ion implantation and enhanced deposition can be done. The maximum pulse voltage output is 80kV

maximum pulse current is 60A

repetition frequency is 50-500Hz

and the pulse rise time is less than 2μs. The power modulator can operate in the pulse bunching mode if necessary. In general

the plasma density is 10 8-10 10 cm -3

the film deposition rate is 0.1-0.5nm/s?