A high dense metal plasma can be produced by using cathodic vacuum arc discharge technique. The microparticles emitted from the cathode in the metal plasma can be removed when the metal plasma passes through the magnetic filter. It is a new technique for making high quality

fine and close thin films which have very widespread applications. In this paper we describe the applications of cathodic vacuum arc technique

and then a filtered plasma deposition and ion implantation system as well as its applications.