基于干涉法的晶体表面微损伤的定位与表征

金利民; 宋丽; 祝万钱; 罗红心; 徐中民; 张增艳

doi:10.11889/j.0253-3219.2018.hjs.41.070101

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基于干涉法的晶体表面微损伤的定位与表征

同步辐射技术及应用 | 更新时间：2021-05-19

- 基于干涉法的晶体表面微损伤的定位与表征
  封面论文
- Positioning and characterization of micro-damage on silicon crystal surface based on optical interference method
- 核技术 2018年41卷第7期文章编号：070101
- 作者机构：
  
  中国科学院上海应用物理研究所张江园区上海 201204
- 作者简介：
  
  [ "金利民, 男, 1984年出生, 2012年于东华大学获博士学位, 高级工程师, 研究领域为同步辐射光学与技术", "JIN Limin, male, born in 1984, graduated from Donghua University with a doctoral degree in 2012, senior engineer, focusing on synchrotron radiation optics & technology" ]
  徐中民, E-mail:xuzhongmin@sinap.ac.cn XU Zhongmin, E-mail: xuzhongmin@sinap.ac.cn
  张增艳, E-mail:zhangzengyan@sinap.ac.cn ZHANG Zengyan, E-mail: zhangzengyan@sinap.ac.cn
- 基金信息：
  
  国家自然科学基金(11105215);上海市自然科学基金(15ZR1448900)
- DOI：10.11889/j.0253-3219.2018.hjs.41.070101
  中图分类号： TL99
- 收稿日期：2018-02-02，
  
  修回日期：2018-03-20，
  
  纸质出版日期：2018-07-10
- 稿件说明：
移动端阅览
金利民, 宋丽, 祝万钱, 等. 基于干涉法的晶体表面微损伤的定位与表征[J]. 核技术, 2018,41(7):070101

Limin JIN, Li SONG, Wanqian ZHU, et al. Positioning and characterization of micro-damage on silicon crystal surface based on optical interference method[J]. Nuclear techniques, 2018, 41(7): 070101
金利民, 宋丽, 祝万钱, 等. 基于干涉法的晶体表面微损伤的定位与表征[J]. 核技术, 2018,41(7):070101 DOI： 10.11889/j.0253-3219.2018.hjs.41.070101.

Limin JIN, Li SONG, Wanqian ZHU, et al. Positioning and characterization of micro-damage on silicon crystal surface based on optical interference method[J]. Nuclear techniques, 2018, 41(7): 070101 DOI： 10.11889/j.0253-3219.2018.hjs.41.070101.

摘要

硅晶体是同步辐射光源光束线站上的关键光学材料之一，主要应用于双晶单色器，其主要作用是将单一波长的谱线分离出来以用于特定的分析实验，实现同步辐射光的“单色化”。因此，晶体的加工质量对同步辐射光的品质具有重要影响，对晶体受光面的质量检测工作也就显得尤为重要。目前的常规方法主要是使用光学显微镜与扫描电镜来检测晶体的表面质量，查看肉眼不可见的微小裂纹、凸起、划痕以及沟槽等损伤。通过实验的方法，提出一种基于光干涉法的较为简便可行的检测方法，即联合利用Fizeau型激光干涉仪与原子力显微镜来检测与定量表征处于晶体工作面的上述损伤。通过确定微损伤的具体位置、定量表征损伤区域的大小（长度、宽度、高度/深度等），评估该微损伤对晶体光学性能的可能性影响，为晶体的表面质量检测与表征提供一种有效可行的简便方法。

Abstract

Background

Silicon crystal is one of the key optical materials in synchrotron radiation beam line. It is mainly used in double-crystal monochromator. Its main function is to separate the single-wavelength beam for the specific analytical experiments. Therefore

the processing quality of the crystal has an important impact on the synchrotron radiation quality

and the quality inspection on the beam-receiving surface of the crystal is also particularly important. The current conventional method is mainly to use optical microscopy and scanning electron microscopy (SEM) to detect the surface quality of the crystal

then discover the invisible micro-cracks

protrusions

scratches

grooves or other type of damage.

Purpose

The aim is to introduce and propose a simple and feasible detection & characterization approach based on optical interference method.

Methods

With the experimental methods

to detect and characterize the above-mentioned damage on the silicon crystal surface by using Fizeau laser interferometer and atomic force microscopy (AFM). By determining the specific location of the micro-damage and quantitatively characterizing its size (length

width

height/depth

etc.)

the possible impacts of the micro-damage on the optical performance of the crystal is evaluated.

Results

The surface morphology of the tested crystal has been detected using Fizeau laser interferometer

and the interference pattern has been obtained. For the surface with micro-damage

an obvious abnormal structure is found to distinguish the location of the micro-damage. It is found as a slight bulge-type injury. The size parameters (width

height) are measured by AFM and compared with the lattice constant respectively. It is found that the former is much larger than the latter

therefore

the re-polishing process is necessary for the crystal.

Conclusion

An effective and feasible method for quality detection and characterization of silicon crystal surface has been proposed.

关键词

Keywords

references

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