基于法线追迹原理的新型高精度面形检测系统

彭川黔; 何玉梅; 王劼

doi:10.11889/j.0253-3219.2017.hjs.40.090101

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基于法线追迹原理的新型高精度面形检测系统

同步辐射技术及应用 | 更新时间：2021-05-19

- 基于法线追迹原理的新型高精度面形检测系统
- A novel high-accuracy deflectometric profiler system based on normal tracing principle
- 核技术 2017年40卷第9期文章编号：090101
- 作者机构：
  
  1.中国科学院上海应用物理研究所嘉定园区上海 201800
  2.中国科学院大学北京 100049
  3.重庆理工大学重庆 400054
- 作者简介：
  
  [ "彭川黔, 男, 1980年出生, 2006年毕业于重庆大学, 现为博士研究生, 研究领域为光学检测", "PENG Chuanqian, male, born in 1980, graduated from Chongqing University in 2006, doctoral student, focusing on optical metrology" ]
  王劼, E-mail:wangjie@sinap.ac.cnWANG Jie, E-mail:wangjie@sinap.ac.cn
- 基金信息：
  
  国家自然科学基金(11179005);国家自然科学基金(11675253);国家重点研发计划(2016YFA0401303)
- DOI：10.11889/j.0253-3219.2017.hjs.40.090101
  中图分类号： TL99
- 收稿日期：2017-01-18，
  
  修回日期：2017-04-03，
  
  纸质出版日期：2017-09-10
- 稿件说明：
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彭川黔, 何玉梅, 王劼. 基于法线追迹原理的新型高精度面形检测系统[J]. 核技术, 2017,40(9):090101

Chuanqian PENG, Yumei HE, Jie WANG. A novel high-accuracy deflectometric profiler system based on normal tracing principle[J]. Nuclear techniques, 2017, 40(9): 090101
彭川黔, 何玉梅, 王劼. 基于法线追迹原理的新型高精度面形检测系统[J]. 核技术, 2017,40(9):090101 DOI： 10.11889/j.0253-3219.2017.hjs.40.090101.

Chuanqian PENG, Yumei HE, Jie WANG. A novel high-accuracy deflectometric profiler system based on normal tracing principle[J]. Nuclear techniques, 2017, 40(9): 090101 DOI： 10.11889/j.0253-3219.2017.hjs.40.090101.

摘要

高精度面形检测系统是同步辐射光源、大型天文望远镜等领域X射线反射镜面的重要检测仪器。为了满足第三代光源及自由电子激光对X射线反射镜面的检测需求，由光学元件加工缺陷引入的系统误差必须得到减小或消除。基于法线追迹原理设计了新型的角度检测系统，在该系统中，小孔及光源组成光束选择装置用于自动选择一束沿待测镜面测量点处法线方向传播的光束。通过测量该光束角度的变化完成对待测镜面面形的检测。将系统中光学元件紧贴小孔放置，减小或消除由相应光学元件加工缺陷引入的角度测量误差。采用法线追迹原理在大角度范围内实现高精度角度检测。

Abstract

Background

High accuracy profile metrology systems are important instruments for the metrology of X-ray mirrors used in many areas like synchrotron facilities and telescopes. Many systematic errors introduced by manufacture defects of optical elements of these metrology systems will affect its performance.

Purpose

This study aims to design a novel high-accuracy deflectometric profiler system to meet the state-of-art high-accuracy metrology requirement of 3rd generation X-ray light sources and X-ray free electron lasers.

Methods

A new type of deflectometric profiler system

based on normal tracing principle

was proposed in which a pinhole and a light source are used to make a beam select system to automatically select a beam which propagates along the normal direction of the measured area on the surface under test. The profile information of the surface under test could be measured by measuring the angle variation of the selected beam.

Results

Systematic errors introduced by manufacture defects of optical elements could be minimized by placing these optical elements as close as possible to the pinhole.

Conclusion

By using the normal tracing principle method

high accuracy metrology for strong curved mirror is possible.

关键词

Keywords

references

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