Liu Zhengmin Zhong Heli Yang Kunshan. Enhanced adhesion induced by MeV F ions for Sb, Ag, Cu, Pd and Ni films on Si[J]. Nuclear techniques, 1991, (1): 54-57.
Liu Zhengmin Zhong Heli Yang Kunshan. Enhanced adhesion induced by MeV F ions for Sb, Ag, Cu, Pd and Ni films on Si[J]. Nuclear techniques, 1991, (1): 54-57.DOI:
Pd and Ni films deposited on Si substrates were irradiated with 6 MeV F ions. The Scotch tape test was employed to measure adhesion changes as a function of dose. It was found that the threshold dose might be associated with the elasticity modulus of metallic film. For a film having a larger value of elasticity modulus
the threshold dose is higher. This phenomenon is qualitatively explained in terms of the stress changes in the film before and after irradiation.