Density and thickness of SnO2 films have been measured by RBS combined with SIMS. The density of the SnO2 films prepared by using atmospheric pressure CVD method is about 6.20g/cm3. Fluorine concentration and distribution in the F-doped SnO2 films（FTO） as well as range distribution parameters

Rp and △Rp

of 19F+ ion- implanted SnO2 films have been measured by use of the 19F（p

a γ）16O resonance nuclear reaction. Fluorine concentration in FTO films varies with depth from 6.0 ×1020/cm3 to 0.6×1020/cm3. The experimental range parameters are compared with those obtained by the TRIM89 program. It is shown that the experimental Rp values agree with the TRIM values very well

but the experimental range straggling △Rp are larger. This phenomenon may be attributed to the enhanced diffusion during ion implantation.