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中国科学院高能物理研究所,北京,100080
纸质出版日期:1992-08-01
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[1]董玉兰.用电子束轰击加热法研制≤50nm厚的α-Fe薄膜吸收体样品[J].核技术,1992(08):504-506.
Dong Yulan. Preparation of a-Fe thin film (≤50 nm) samples by electron beam bombardment[J]. Nuclear techniques, 1992, (8): 504-506.
[1]董玉兰.用电子束轰击加热法研制≤50nm厚的α-Fe薄膜吸收体样品[J].核技术,1992(08):504-506. DOI:
Dong Yulan. Preparation of a-Fe thin film (≤50 nm) samples by electron beam bombardment[J]. Nuclear techniques, 1992, (8): 504-506. DOI:
在真空室用电子束轰击加热蒸发的方法
研制成功表面呈银白色且光亮的≤50nm厚的α-Fe薄膜(吸收体)样品。该样品较纯
且均匀、牢固
用它作为标准样品校正正比计数器式深度灵敏内转换电子穆斯堡尔谱仪的性能
其效果良好。
A method is described of preparing a - Fe thin film absorber samples by electron beam bombardment in a vacuum chamber. The film is about ≤50 nm thick
silverly -white and bright
and uniform. It has been successfully used in a depth - sensitive internal conversion electron Mossbauer spectrometer using the proportional counter.
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