The techniques to make X-ray spiral zone plates using electron beam and X-ray lithography were studied. A master mask was fabricated on polyimide membrane by E-beam lithography and micro-electroplating. Spiral zone plates were efficiently replicated by X-ray lithography and micro-electroplating. By combining the techniques

spiral zone plates at 1 keV were successfully fabricate. With an outermost zone width of the 200 nm

and the gold absorbers thickness of 700 nm

the high quality zone plates can be used for X-ray phase contrast microscopy.