Helium-charged nanocrystalline titanium films were deposited by He-Ar magnetron sputtering.The he- lium content

microstructure and average grain size of the nanocrystalline titanium films were studied by PBS(proton backscattering)and XRD(X-ray diffraction).The results indicated that under the same deposition parameters except the substrate temperature

which increased from 60℃to 350℃

the helium content decreased gradually from 38.6%to 9.2%and the grain size increased from 13.1 nm to 44.2 nm.When the flux ratio of He/Ar was 6

10

15 and 19

he- lium content of the films was 17.6%

47.2%

48.3%and 38.6%

respectively.The Bragg peak of(002)crystal plane in the film had a slight shift to of the left comparing with that of the pure Ti film

while Bragg peak of(100)crystal plane did not change.This indicated that the lattice parameter c increased but the lattice parameter a remained the same.With increasing helium content in the film

the diffraction peaks broadened and grain sizes decreased.These further indicated that the incorporation of helium has an inhibition function to the grain growth of the film.