Low energy ion beam assisted deposition(IBAD)was employed to prepare Cu

Ag or Pt films on Mo/Si(100)substrate.When the film deposition was performed with simultaneous bombardment of 500 eV Ar ion beam normal to the film surface at ion/atom arrival ratio of 0.2

the prepared Cu films were(111)preferred orientation

Ag and Pt films were(111)and(200)mixed orientations.When the Ar ion beam was off-normal direction of the film surface 45°

the prepared Cu

Ag and Pt films all exhibited highly preferred(111)orientation.Monte Carlo method was used to calculate the sputtering yields of Ar ions incident on single crystal Ag(100)and(111)plane at various in- cident angles and azimuth angles respectively.The effects of channeling effects and surface free energy on the crys- tallographic texture of Cu

Ag and Pt films are discussed.