The blistering and flaking behavior of many kinds of amorphous alloys under helium ion bombardment at room temperature has been investigated. Helium ions with energies of 40keV and 60keV were implanted to the dose range 1.0×10 18-4.0×10 18 ions/cm 2. The surface topography of samples after irradiation was observed by using a scanning electron microscope. The diameter of blister and the thickness of exfoliated blister lids were measured. The results showed that many kinds of surface topography characteristics appeared for different doses

energies and amorphous alloys

such as flaking

blistering

exfoliation

blister rupture

second-generation blistering and porous structure. The dependence of surface damage modes and the critical dose for onset of blistering and flaking on material sort and ion energy was discussed.