GUO Hongxia HAN Fubin CHEN Yusheng ZHOU Hui HE Chaohui. Study of hard X-ray dose enhancement effects for some kinds of semiconductor devices[J]. Nuclear techniques, 2002, (10): 811-816.
GUO Hongxia HAN Fubin CHEN Yusheng ZHOU Hui HE Chaohui. Study of hard X-ray dose enhancement effects for some kinds of semiconductor devices[J]. Nuclear techniques, 2002, (10): 811-816.DOI:
Experimental results of X-ray dose enhancement effects are given for CMOS4069 and floating gate ROMs irradiated in Beijing Synchrotron Radiation Facility and in cobalt source. Shift of threshold voltage vs. total dose for CMOS4069 and the errors vs. total dose for 28f256 and 29c256 have been tested on line and the equivalent relation of total dose damage under the same accumulated dose is provided comparing the response of devices irradiated by X-ray and γ-ray source. These results can be provided for X-ray radiation hardening technology as an effective evaluation data.