[1]董立军,陈大鹏,谢常青,韩敬东,叶甜春,伊福廷,彭良强,韩勇,张菊芳.50 nm X射线光刻掩模制备关键技术[J].核技术,2004(02):96-98.

DONG Lijun CHEN Dapeng XIE Changqing HAN Jingdong YE Tianchun. Key technology of mask making for 50 nm X-ray lithography[J]. Nuclear techniques, 2004, (2): 96-98.

[1]董立军,陈大鹏,谢常青,韩敬东,叶甜春,伊福廷,彭良强,韩勇,张菊芳.50 nm X射线光刻掩模制备关键技术[J].核技术,2004(02):96-98. DOI：

DONG Lijun CHEN Dapeng XIE Changqing HAN Jingdong YE Tianchun. Key technology of mask making for 50 nm X-ray lithography[J]. Nuclear techniques, 2004, (2): 96-98. DOI：