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四川大学原子核科学技术研究所
收稿日期:1984-04-19,
纸质出版日期:1986-02
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陈元儒, 王培录, 姜景云, 等. 离子束分解卤化物涂层镀膜技术的初步实验[J]. 核技术, 1986,09(2):13-16,59.
Yuanru Chen, Peilu Wang, Jingyun Jiang, et al. Preliminary experiments for thin films plating technology of halide coating by ion beam decomposition[J]. Nuclear techniques, 1986, 09(2): 13-16,59.
离子束轰击化合物涂层镀膜是七十年代发展起来的一种新方法。本文叙述了用这种方法在硅片和玻璃片上形成钯膜的过程,并给出了用扫描电子显微镜和俄歇电子谱仪观察分析的结果。最后讨论了镀膜的机理和可能的应用。
Formation of thin films by ion beam bombardment of the coatings of the compounds is a new method which was developed in 1970s. The process to form palladium thin films on the substrate of sillicons and glasses is described and the results obtained by means of scanning electron microscopy and Auger electron spectroscopy are given. In the last paragraph the mechanism and the possible applications of ion beam plated films are discussed.
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