Peilu Wang, Ping Zhou, Zhongyang Liu, et al. Electrical conductivity and XPS spectra of the ion implanted Q thin films[J]. Nuclear techniques, 1990, 13(6): 350-354.
Peilu Wang, Ping Zhou, Zhongyang Liu, et al. Electrical conductivity and XPS spectra of the ion implanted Q thin films[J]. Nuclear techniques, 1990, 13(6): 350-354.DOI:
Ion implantation causes an increase of electrical conductivity of the Q thin films by 8 orders of magnitude and the saturated value is about 2×10
-3
(
Ω
cm)
-1
. The conductivity is very stable under exposure to ambient conditions. XPS analysis has shown a notable increase of carbon concentration an obvious decrease of oxygen concentration and a change of the pristine structure in the implahted zone. The results indicate that structure change is a main reason for the increase of electrical conductivity.
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