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复旦大学
收稿日期:1986-12-08,
纸质出版日期:1990-02-01
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邵其鋆, 承焕生, 徐洪杰. 表面峰强度的Monte Carlo模拟计算[J]. 核技术, 1990,13(2):91-97.
Qiyun Shao, Huansheng Cheng, Hongjie Xu. Monte Carlo calculation of surface peak intensity[J]. Nuclear techniques, 1990, 13(2): 91-97.
邵其鋆, 承焕生, 徐洪杰. 表面峰强度的Monte Carlo模拟计算[J]. 核技术, 1990,13(2):91-97. DOI:
Qiyun Shao, Huansheng Cheng, Hongjie Xu. Monte Carlo calculation of surface peak intensity[J]. Nuclear techniques, 1990, 13(2): 91-97. DOI:
本文介绍用Monte Carlo模拟方法对入射He
+
离子能量在0.1—2.0MeV范围内,硅、铝单晶在几种不同表面结构条件下的表面峰强度进行了计算。讨论了离子入射能量、入射角度、晶格原子热振动幅度、相关系数、表面增强因子、原子位移和吸附原子等因素对计算结果的影响。
The surface peak intensity for silicon and aluminium crystals has been studied for He
ion incident energy ranging from 0.1 to 2.0 MeV by the Monte Carlo simulation method assuming a variety of surface structure models. The effects of He
ion incident energy and incident angle
thermal vibration amplitude
correlations of thermal vibrations
displacements and adsorption of surface atoms as well as enhancement factor on the surface peak intensity are investigated.
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