The dual-purpose machine of ion implantation and vacuum evaporation-ion beam mixing developed by the university can generate beam current of middle intensity in large area. It has the directional evaporation source which possesses high heat efficiency and can save the raw material and avoid serious pollution to the system. It can automatically scan large target in the chamber for either large or small workpieces. The conventional mass analyser and special acceleration-focussing lenses can be saved. Simple structure

convenient operation

lower price and higher economic benefit make the feature of this machine. It can be used as a means of research or production for new material. It also can be used in surface modification of non-semiconductors material and in ion beam irradiation of seeds of plants.