离子注入机、单级静电加速器，各类高能重离子加速器和各种利用离子束对固体等材料进行表面分析（如卢瑟福散射，沟道效应技术等）的装置中均需重离子源，特别是强流（每秒大于10

13

粒子）多电荷重离子源对提高被加速离子的能量，实现装置的小型化具有重要意义。例如对重离子回旋加速器，被加速离子每个核子的能量直接正比于电荷数

Q

的平方：

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A duoplasmatron for multiple charged ions is described. The construction of the ion source and experimental results are given. The ion beam of He

2+

B

2+

N

2+

and Ar

2+

up to tens microampers have been obtained.