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Study on factors affectingthe resolution of extreme ultraviolet interference lithography based on modulation transfer function
SYNCHROTRON RADIATION TECHNOLOGY AND APPLICATIONS | 更新时间：2025-09-01

    • Study on factors affectingthe resolution of extreme ultraviolet interference lithography based on modulation transfer function

    • “Extreme ultraviolet interference lithography technology plays an important role in the detection of photoresist properties. Experts have constructed simulation models to evaluate influencing factors and successfully achieved 12.5 nanometer resolution exposure, providing new directions for the development of lithography technology.”
    • NUCLEAR TECHNIQUES   Vol. 48, Issue 8, Article number: 080101(2025)

    • DOI：10.11889/j.0253-3219.2025.hjs.48.240451    

      CLC： TL99

    • Received：10 November 2024，

      Revised：25 January 2025，

      Published：15 August 2025

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  • ZHAO Jun,MENG Xiangyu,GUO Zhi,et al.Study on factors affectingthe resolution of extreme ultraviolet interference lithography based on modulation transfer function[J].NUCLEAR TECHNIQUES,2025,48(08):080101. DOI： 10.11889/j.0253-3219.2025.hjs.48.240451. CSTR： 32193.14.hjs.CN31-1342/TL.2025.48.240451.

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