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Emulation of synchrotron radiation high-resolution actinic review for EUV mask
SYNCHROTRON RADIATION TECHNOLOGY AND APPLICATIONS | 更新时间：2025-04-03
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    • Emulation of synchrotron radiation high-resolution actinic review for EUV mask

    • “In the field of extreme ultraviolet lithography, researchers have proposed elliptical band plate technology to achieve a maximum resolution of 12 nanometers, providing a new solution for EUV mask defect analysis.”
    • NUCLEAR TECHNIQUES   Vol. 48, Issue 3, Article number: 030102(2025)

    • DOI：10.11889/j.0253-3219.2025.hjs.48.240151    

      CLC： TL99

    • Received：15 April 2024，

      Published：15 March 2025

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  • SU Zijing,LIU Haigang,MENG Xiangyu,et al.Emulation of synchrotron radiation high-resolution actinic review for EUV mask[J].NUCLEAR TECHNIQUES,2025,48(03):030102-030102. DOI： 10.11889/j.0253-3219.2025.hjs.48.240151. CSTR： 32193.14.hjs.CN31-1342/TL.2025.48.240151.

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