Damage law and mechanism of total dose of PDSOI transistors with different channel lengths caused by backgate bias
“In the semiconductor field, researchers have investigated the effect of back gate bias on the electrical parameters of PD SOI MOSFETs and found that back gate bias can significantly enhance the damage of long channel transistors.”
WANG Haiyang, male, born in 1998, graduated from Harbin Institute of Technology in 2018, master student, focusing on the mechanism and model of total dose effect of SOI device backgate regulation
GUO Qi, E-mail: guoqi@ms.xjb.ac.cn
基金信息:
the Natural Science Foundation of Xinjiang Uygur Autonomous Region(2021D01E06);the National Natural Science Foundation of China(12075313);the Youth Innovation Promotion Association of Chinese Academy of Sciences(2020430;2018473)
WANG Haiyang,ZHENG Qiwen,CUI Jiangwei,et al.Damage law and mechanism of total dose of PDSOI transistors with different channel lengths caused by backgate bias[J].NUCLEAR TECHNIQUES,2022,45(05):49-54.
WANG Haiyang,ZHENG Qiwen,CUI Jiangwei,et al.Damage law and mechanism of total dose of PDSOI transistors with different channel lengths caused by backgate bias[J].NUCLEAR TECHNIQUES,2022,45(05):49-54. DOI: 10.11889/j.0253-3219.2022.hjs.45.050502.
Damage law and mechanism of total dose of PDSOI transistors with different channel lengths caused by backgate bias