Thickness measurement of thin solid films by 2MeV <sup>4</sup>He+ Rutherford backscattering

Zhao Yuhua Xu Guoji Zheng Shengnan Xu Yongchang

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Thickness measurement of thin solid films by 2MeV ⁴He+ Rutherford backscattering

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- Thickness measurement of thin solid films by 2MeV ⁴He+ Rutherford backscattering
- NUCLEAR TECHNIQUES Issue 6, (1991)
- 作者机构：
  
  中国原子能科学研究院
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- Published：01 June 1991
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[1]赵玉华,许国基,郑胜男,徐永昌.2MeV ~4He~+背散射测定固体薄膜厚度的研究[J].核技术,1991(06):326-332.

Zhao Yuhua Xu Guoji Zheng Shengnan Xu Yongchang. Thickness measurement of thin solid films by 2MeV ⁴He+ Rutherford backscattering[J]. Nuclear techniques, 1991, (6): 326-332.
[1]赵玉华,许国基,郑胜男,徐永昌.2MeV ~4He~+背散射测定固体薄膜厚度的研究[J].核技术,1991(06):326-332. DOI：

Zhao Yuhua Xu Guoji Zheng Shengnan Xu Yongchang. Thickness measurement of thin solid films by 2MeV ⁴He+ Rutherford backscattering[J]. Nuclear techniques, 1991, (6): 326-332. DOI：

摘要

本文从实验上研究了用2MeV

背散射对从几十nm到几个μm范围内的各种固体薄膜的厚度进行精确测量的方法。并对各种测量方法和测量结果进行了详细的讨论。

Abstract

The methods of precisely measuring thin solid film thickness in the range of tens nm to several μm by 2MeV 4He+ Rutherford backseattering are studied. Detailed discussion about different methods and the experimental results are given.

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Thickness measurement of thin solid films by 2MeV 4He+ Rutherford backscattering

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摘要

Abstract

关键词

Keywords

references

Thickness measurement of thin solid films by 2MeV ⁴He+ Rutherford backscattering