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A study of high-dose P￣+ ions implantation into single-crystal silicon
更新时间：2021-04-09

    • A study of high-dose P￣+ ions implantation into single-crystal silicon

    • NUCLEAR TECHNIQUES   Issue 2, (1994)
    • CLC： TN305

    • Published：01 February 1994

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  • Gao Jianxia. A study of high-dose P￣+ ions implantation into single-crystal silicon[J]. Nuclear techniques, 1994, (2). DOI：

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