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中国科学院近代物理研究所
Published:01 January 1998
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[1]李宗伟,杨维凡,方克明,袁双贵,郭俊盛,潘强岩.电镀法制备Pa测量源[J].核技术,1998(01):7-10.
LI Zongwei YANG Weifan FANG KemingYUAN Shuanggui GUO Junsheng PAN Qiangyan. Preparation of protactinium measurement source byelectroplating method[J]. Nuclear techniques, 1998, (1).
用233Pa作示踪剂,对影响电镀Pa的主要因素(如pH值、电镀时间和电流密度等)进行了实验和讨论。用HPGe能谱仪对镀源进行测量,以确定化学效率。并在不锈钢片上获得了薄而均匀的Pa镀源,其厚度为1mg/cm2。
An electroplating method for the preparation of Pa sources is described
and themain factors (such as pH value of solution electroplating time and current density)influencing the electroplating of Pa are tested and discussed with 233Pa as a tracer. Athin and uniform electroplating Pa-Layer of 1mg/cm2 thick on thin stainless steeldisk was obtained. The Pa source was measured by HPGe detector to determine thechemical efficiency.
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