YUE Yan HUO Yukun PAN Zhengying. A study of transient diffusion mechanism in low-temperature epitaxy process of thin metal films[J]. Nuclear techniques, 1998, (10): 577-581.
YUE Yan HUO Yukun PAN Zhengying. A study of transient diffusion mechanism in low-temperature epitaxy process of thin metal films[J]. Nuclear techniques, 1998, (10): 577-581.DOI:
A study of transient diffusion mechanism in low-temperature epitaxy process of thin metal films
The transient diffusion processes in low-temperature epitaxial growth of Cu thin film on Cu(100) have been studied and classified by using molecular dynamics simulations with a hydrid tight-binding-like potential. The statistics indicate that the noticeable contribution to the surface mobility of adatoms comes from the impact cascade diffusion mechanism. Meanwhile
the observed oscillations of diffraction intensity show that a quasi layer-by-layer growth may take place at the temperature as low as 100K in the initial stage of thin-film formation.