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A study of transient diffusion mechanism in low-temperature epitaxy process of thin metal films
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    • A study of transient diffusion mechanism in low-temperature epitaxy process of thin metal films

    • NUCLEAR TECHNIQUES   Issue 10, (1998)
    • CLC: O484
    • Published:01 October 1998

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  • YUE Yan HUO Yukun PAN Zhengying. A study of transient diffusion mechanism in low-temperature epitaxy process of thin metal films[J]. Nuclear techniques, 1998, (10): 577-581. DOI:

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