Research on sputtering-, projectile- and cascade-carrying forward in cell model by implanted 30keV N￣+ ions

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Research on sputtering-, projectile- and cascade-carrying forward in cell model by implanted 30keV N￣+ ions

更新时间：2021-04-09

- Research on sputtering-, projectile- and cascade-carrying forward in cell model by implanted 30keV N￣+ ions
- NUCLEAR TECHNIQUES Issue 3, (1996)
- 作者机构：
  
  中国科学院近代物理研究所
- 作者简介：
- 基金信息：
- DOI：
  CLC： TL629.1
- Published：01 March 1996
- 稿件说明：
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[1]韩光武,马受武,卫增泉.注入30keVN~＋在模拟细胞中的溅射级联推进[J].核技术,1996(03):152-154.

Research on sputtering-, projectile- and cascade-carrying forward in cell model by implanted 30keV N￣+ ions[J]. Nuclear techniques, 1996, (3).
[1]韩光武,马受武,卫增泉.注入30keVN~＋在模拟细胞中的溅射级联推进[J].核技术,1996(03):152-154. DOI：

Research on sputtering-, projectile- and cascade-carrying forward in cell model by implanted 30keV N￣+ ions[J]. Nuclear techniques, 1996, (3). DOI：

摘要

用ＭｏｎｔｅＣａｒｌｏ方法模拟计算了３０ｋｅＶ的Ｎ＋在模拟细胞中溅射级联推进的影响。从计算结果看，在用１０１７个／ｃｍ２的３０ｋｅＶ的Ｎ＋注入生物材料时，溅射级联推进约为０．３４μｍ，故得出溅射级联推进作用不大可能造成植物诱变的结论。讨论了低能重离子引起外基因导入的物理可能性──溅射级联推进。

Abstract

The forward displacement of atoms in the model cell due to cascade collisions induced by the bombardment of 30keV N+ ions is investigated with the Monte Carlo method. It is shown that the forward displacement is only 0.34μm when 1×1017ions/cm2 are implanted

suggesting that the forward displacement would not seem to cause the plant mutation. The mutation is probably induced by the X-rap produced by the low energy heavy ion projectiles.

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