Microstructure characteristics of ZrO2-Y2O3 films with different post-treatment

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Microstructure characteristics of ZrO₂-Y₂O₃ films with different post-treatment

更新时间：2021-04-09

- Microstructure characteristics of ZrO₂-Y₂O₃ films with different post-treatment
- NUCLEAR TECHNIQUES Issue 1, (1995)
- 作者机构：
  
  四川大学原子核科学技术研究所
- 作者简介：
- 基金信息：
- DOI：
  CLC： TN304.055
- Published：01 January 1995
- 稿件说明：
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[1]黄宁康,汪德志,熊兆奎.电子束和热退火后处理的射频溅射沉积ZrO_2－Y_2O_3薄膜的结构特征[J].核技术,1995(01):10-14.

Microstructure characteristics of ZrO₂-Y₂O₃ films with different post-treatment[J]. Nuclear techniques, 1995, (1).
[1]黄宁康,汪德志,熊兆奎.电子束和热退火后处理的射频溅射沉积ZrO_2－Y_2O_3薄膜的结构特征[J].核技术,1995(01):10-14. DOI：

Microstructure characteristics of ZrO₂-Y₂O₃ films with different post-treatment[J]. Nuclear techniques, 1995, (1). DOI：

对射频磁控溅射沉积的ＺｒＯ２－１２ｗｔ％Ｙ２Ｏ３薄膜进行了电子束处理和热退火处理．通过ＸＲＤ、ＸＰＳ、ＳＥＭ等的微观分析，研究了薄膜的相结构组成、薄膜主要组成元素的氧化态以及薄膜的形貌特征。并对以提高薄膜增韧性为目的而进行的后处理的方式选择作了讨论。

Post-treatment such as electron beam heating and thermal annealing

was usedfor the r.f. magnetron sputtering deposited ZrO2-12wt%Y2O3 films. Studies on phasecomposition

oxidized states of Zr

and characterized morphologies of the films beforeand after post-treatment were made with SEM

XRD and XPS

and the selection ofpost treatment to increase film’s durability was also discussed.

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Microstructure characteristics of ZrO₂-Y₂O₃ films with different post-treatment