您当前的位置:
首页 >
文章列表页 >
Characteristics of Mosx films deposited by ion beam assistance
更新时间:2021-04-09
    • Characteristics of Mosx films deposited by ion beam assistance

    • NUCLEAR TECHNIQUES   Issue 10, (1995)
    • CLC: O658.12
    • Published:01 October 1995

    移动端阅览

  • Characteristics of Mosx films deposited by ion beam assistance[J]. Nuclear techniques, 1995, (10). DOI:

  •  
  •  

0

Views

53

下载量

0

CSCD

Alert me when the article has been cited
提交
Tools
Download
Export Citation
Share
Add to favorites
Add to my album

Related Articles

Study of TiCxNy films formed by ion beam assisted depositionon 9Cr18 steel
Preparation of Ta-GCr15 amorphous film by ion beam mixing and its properties
Modelling studied of precision friction components by ion implantation
Property of multilayer TiCN films formed by ion-beam-assisted-deposition
Experimental study of nano-composite superhard TiN/Si34 films prepared by ion beam assisted deposition

Related Author

廖小东
郑思孝
刘仲阳
孙官清
王培录
Jie Weng
Peilu Wang
Jingyun Jiang

Related Institution

Institute of Nuclear Science and Technology of Sichuan Union University
Open Laboratory of Radiation Physics and Technology, State Education Commission
四
Sichuan University
Institute of Nuclear Science and Technology, Sichuan University
0