100 keV ion implanter for metal surface modification has been constructed. It has two functions
i.e. direct implantation of nitrogen ions with energy of tens to 100 keV into work pieces
or ion beam mixing and recoil implantation adopted for implanting non-nitrogen elements. The overall structure and major parts of the imlanter are described. After tuning the main work parameters
the machine has met the design target. The machine runs stably and reliably and several experiments on metal surface modification are being performed.
Accelerator-TEM interface facility and application
A 200 keV H2+/He+ ion implanter
The accelerator-electron microscope interface facility at Wuhan University
Acceptance diagram analysis of the ion implanter
Amorphous Ti-Al and Fe-Al alloys formed by 100keV Ar ion mixing
Related Author
范湘军
郭立平
王泽松
周霖
杨铮
何俊
黎明
LIU Chuansheng~1 LI Ming~1 HE Jun~1 YANG Zheng~1 ZHOU Lin~1 WANG Zesong~1 GUO Liping~1 JIANG Changzhong~1 YANG Shibo~1 LIU Jiarui~2 Lee J C~3 FU DeJun~1 FAN Xiangjun~1 1
Related Institution
Accelerator Laboratory
Wuhan University,Wuhan 430072,China) 2
Quantum-Functional Semiconductor Research Center Dongguk University
China Institute of Atomic Energy
Accelerator Laboratory, School of Physics, Wuhan University