Preparation and utilization of targets for sputter negative ion sources

Xu Tianbing Zhou Junsi Qiu Changqing Zhu Peiran

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Preparation and utilization of targets for sputter negative ion sources

更新时间：2021-04-09

- Preparation and utilization of targets for sputter negative ion sources
- NUCLEAR TECHNIQUES Issue 9, (1993)
- 作者机构：
  
  1. 中国科学院物理研究所
  2. 中国科学院物理研究所,北京,100080
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Published：01 September 1993
- 稿件说明：
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[1]徐天冰,周俊思,邱长青,朱沛然.溅射负离子源靶的制作与使用[J].核技术,1993(09):567-570.

Xu Tianbing Zhou Junsi Qiu Changqing Zhu Peiran. Preparation and utilization of targets for sputter negative ion sources[J]. Nuclear techniques, 1993, (9): 567-570.
[1]徐天冰,周俊思,邱长青,朱沛然.溅射负离子源靶的制作与使用[J].核技术,1993(09):567-570. DOI：

Xu Tianbing Zhou Junsi Qiu Changqing Zhu Peiran. Preparation and utilization of targets for sputter negative ion sources[J]. Nuclear techniques, 1993, (9): 567-570. DOI：

摘要

研究制作了多种溅射负离子源靶

在2×1.7MV串列加速器上采用Middleton-Ⅶ型溅射负离子源引出了流强大、稳定的30多种元素的负离子束。探讨了靶的材料、形状和尺寸等因素对束流质量的影响

以及如何通过控制铯蒸汽、电离器电流、靶压和靶位等来改善束流的质量

提高靶及电离器的寿命

降低源体的污染等。

Abstract

The preparation of various kinds of targets for Middleton Ⅶ type ion source is described. More than 30 negative ion species with fairly high beam intensity can be obtained on the 2×1.7MV tandem accelerator. The effects of material

shape and size of targets on beam qualities have been studied. The operating parameters

such as cesium vapor pressure

ionizer current

target voltage and the position of target were also optimized to prolong target’s lifetime and improve beam’s qualities.

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