The ion - electron - atom beams combination deposition technique and morphology of deposited films

Huang Ningkang

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The ion - electron - atom beams combination deposition technique and morphology of deposited films

更新时间：2021-04-09

- The ion - electron - atom beams combination deposition technique and morphology of deposited films
- NUCLEAR TECHNIQUES Issue 8, (1992)
- 作者机构：
  
  四川大学原子核科学技术研究所,成都,610064
- 作者简介：
- 基金信息：
- DOI：
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- Published：01 August 1992
- 稿件说明：
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[1]黄宁康.离子束-电子束-原子束结合沉积技术制成膜的形貌特征[J].核技术,1992(08):499-503.

Huang Ningkang. The ion - electron - atom beams combination deposition technique and morphology of deposited films[J]. Nuclear techniques, 1992, (8): 499-503.
[1]黄宁康.离子束-电子束-原子束结合沉积技术制成膜的形貌特征[J].核技术,1992(08):499-503. DOI：

Huang Ningkang. The ion - electron - atom beams combination deposition technique and morphology of deposited films[J]. Nuclear techniques, 1992, (8): 499-503. DOI：

摘要

简要介绍离子束-电子束-原子束结合沉积技术的原理及特点

并对该技术制备的各种合金、陶瓷以及复合膜的形貌特征进行了分析研究。

Abstract

The principle and characteristics of the ion - electron - atom beams combination depos-tion technique are outlined. Morphology of the deposited films such as alloy

ceramic and their composite films is studied.

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