您当前的位置:
首页 >
文章列表页 >
Investigation of defects of molecular beam epitaxial Si by slow positron beam
更新时间:2021-03-12
    • Investigation of defects of molecular beam epitaxial Si by slow positron beam

    • NUCLEAR TECHNIQUES   Issue 2, (2000)
    • CLC: O474
    • Published:01 February 2000

    移动端阅览

  • Investigation of defects of molecular beam epitaxial Si by slow positron beam[J]. Nuclear techniques, 2000, (2). DOI:

  •  
  •  

0

Views

98

下载量

1

CSCD

Alert me when the article has been cited
提交
Tools
Download
Export Citation
Share
Add to favorites
Add to my album

Related Articles

Investigation of defects produced by low energy As ̄+
Application of positron annihilation to study the effect of calcium oxide addition on the sintering process of alumina nanoceramics
Positron annihilation study on defect repair of pure iron and RPV steel under electropulsing treatment
Effect on ZnO thin film photoluminescence after Ag ion implantation
Radiation damages to Co-doped ZnO single crystals by 2.5 MeV neutrons

Related Author

WENG Huimin1
2 HUANG Qianfeng1 DU Gang1 HAN Rongdian1
2 1
韩荣典
WU Yichu
YANG Xuanye
ZHAO Wenzheng
ZHANG Simin

Related Institution

中国科学技术大学中国科学院上海冶金研究所
中国科学院上海冶金研究所
University of Science and Technology of China,Heifei 230026) 2
School of Physics and Technology, Hubei Key Laboratory of Nuclear Solid State Physics, Wuhan University
Suzhou Nuclear Power Research Institute
0