Numerical simulations of beam-pinching characteristics in a rod-pinch diode

GAO Yi1; 2 QIU Aici2 LV Min1 YANG Hailiang2 ZHANG Zhong2 ZHANG Pengfei2 1

doi:null

您当前的位置：

首页 >

文章列表页 >

Numerical simulations of beam-pinching characteristics in a rod-pinch diode

更新时间：2021-03-05

- Numerical simulations of beam-pinching characteristics in a rod-pinch diode
- NUCLEAR TECHNIQUES Vol. 33, Issue 8, (2010)
- 作者机构：
  
  1. 清华大学工程物理系
  2. 西北核技术研究所
- 作者简介：
- 基金信息：
  
  国家自然科学基金(10775112)资助
- DOI：
  CLC： TL501.5
- Published：01 August 2010
- 稿件说明：
移动端阅览
[1]高屹,邱爱慈,吕敏,杨海亮,张众,张鹏飞.Rod-pinch二极管箍缩特性的数值模拟[J].核技术,2010,33(08):575-579.

GAO Yi1, 2 QIU Aici2 LV Min1 YANG Hailiang2 ZHANG Zhong2 ZHANG Pengfei2 1. Numerical simulations of beam-pinching characteristics in a rod-pinch diode[J]. Nuclear techniques, 2010, 33(8): 575-579.
[1]高屹,邱爱慈,吕敏,杨海亮,张众,张鹏飞.Rod-pinch二极管箍缩特性的数值模拟[J].核技术,2010,33(08):575-579. DOI：

GAO Yi1, 2 QIU Aici2 LV Min1 YANG Hailiang2 ZHANG Zhong2 ZHANG Pengfei2 1. Numerical simulations of beam-pinching characteristics in a rod-pinch diode[J]. Nuclear techniques, 2010, 33(8): 575-579. DOI：

摘要

采用UNIPIC程序模拟Rod-pinch二极管（RPD）的工作过程

重点研究阳极等离子体和二极管结构参数对电子束箍缩的影响。模拟结果表明

在不考虑阳极离子流作用情况下

RPD无法在较低电压下（<2MV）实现箍缩;当阳极离子流达到一定值后

进一步增加阳极表面发射离子流密度对二极管总电流和阳极杆尖端电流密度影响很小;阴极不同表面发射电子束的箍缩效果不同

各表面同时发射电子时

后表面发射的电子束箍缩效果最好

其次是中间表面

前表面最差;增大阴极厚度不能显著缩短电子束实现箍缩的时间。给出了阳极杆伸出阴极平面距离和阴阳极半径比等参数的选取范围

对模拟计算与实验结果间的偏差作出了解释。

Abstract

The UNIPIC code is used to simulate working process of a rod-pinch diode.The influences of anode plasmas and diode structural parameters on electron pinching are investigated.The electron beams don’t pinch to the rod tip at 1-2 MV without the ion effect.When the ions emitted from the anode surface reach a current of certain value

further increase of the ion current does not have a significant influence on the diode total current and the current density at the rod tip.With all the three surfaces of the cathode emitting electrons

the pinching quality of the electron beam emitted from the upstream surface is the best of all surfaces.Increasing the cathode length does not have an obvious effect in accelerating the process to achieve strong pinching.Influence of the distance from the anode tip to the cathode surface is analyzed

too.The differences between numerical simulations and experimental results are explained.

关键词

Keywords

references

Views

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

Study on catalytic oxidation of low concentration ¹⁴CH₄ by non-thermal plasma

Thrust measurement methods for electric propulsion based on flexible beam structure

The periodic etching of tungsten surface induced by hydrogen ion irradiation

Investigation of plasma stealth excited by 90Sr/90Y

Method of triggering the vacuum arc ion source with a resistor

Related Author

PEI Jianlu

LIANG Shuwei

LIN Zhongxin

LI Jiayu

CHEN Jianli

HAN Ming

HOU Jianrong

LI Yongguo

Related Institution

CNNC Key Laboratory of Radioactive Gas Purification Technology, China Institute for Radiation Protection

School of Mechanical Engineering and Energy Engineering, Beijing University of Technology

State Key Laboratory of High Temperature Gas Dynamics, Institute of Mechanics, Chinese Academy of Sciences

Hefei Institutes of Physical Science, Chinese Academy of Sciences

University of Science and Technology of China

AI问答

Address：2019 Jialuo Road, Jiading, Shanghai, China Postal code：201800
Tel：021-39194977 Email：LHB@sinap.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 沪ICP备05005479号-1 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.
Total Visits：881187 Visits Today：714

⁰