PENG Guoliang1 LI Tiecheng1 ZHANG Wenyong1 PENG Ting1 AI Zhiwei1 GUO Liping1 HE Qing2 WEN Wen2 1. XRD study on SixMn1-x diluted magnetic semiconductors prepared by ion implantation[J]. Nuclear techniques, 2010, 33(6): 457-460.
PENG Guoliang1 LI Tiecheng1 ZHANG Wenyong1 PENG Ting1 AI Zhiwei1 GUO Liping1 HE Qing2 WEN Wen2 1. XRD study on SixMn1-x diluted magnetic semiconductors prepared by ion implantation[J]. Nuclear techniques, 2010, 33(6): 457-460.DOI:
XRD study on SixMn1-x diluted magnetic semiconductors prepared by ion implantation
SixMn1-x diluted magnetic semiconductors(DMS) were prepared by implanting 200 keV Mn ions into p-Si(100) wafers and annealing them at 600°C
700°C
800°C or 900°C under N2 atmosphere.The samples were studied by means of synchrotron radiation X-ray diffraction at SSRF(Shanghai Synchrotron Radiation Facility).It was found that the Mn implantation and thermal annealing resulted in appearance of silicon crystalline particles.At increasing annealing temperatures
the number of Mn atoms on interstitial sites decreased gradually while those on substitution sites increased.And the crystal lattice expanded
too.Interaction of Mn atoms between interstitial and substitution sites increased the ferromagnetism of SixMn1-x DMS samples.