The techniques to make X-ray spiral zone plates using electron beam and X-ray lithography were studied. A master mask was fabricated on polyimide membrane by E-beam lithography and micro-electroplating. Spiral zone plates were efficiently replicated by X-ray lithography and micro-electroplating. By combining the techniques
spiral zone plates at 1 keV were successfully fabricate. With an outermost zone width of the 200 nm
and the gold absorbers thickness of 700 nm
the high quality zone plates can be used for X-ray phase contrast microscopy.
Development of 2D/3D X-ray imaging system based on small size betatron
Comparative study on cell membrane permeability of SDS and Triton X-100
Simulation study of anode gas and potential distribution of fuel cell based on lattice Boltzmann method
Synchrotron radiation X-ray lithography beamline design for 50nm resolution and below
Key technology of mask making for 50 nm X-ray lithography
Related Author
LI Jiatong
WU Ziqi
HEI Daqian
JIA Wenbao
SUN Aiyun
ZHU Ying
ZHANG Jichao
KONG Huating
Related Institution
Lanzhou University
Nanjing University of Aeronautics and Astronautics
University of Chinese Academy of Sciences
The Interdisciplinary Research Center, Shanghai Synchrotron Radiation Facility, Zhangjiang Laboratory, Shanghai Advanced Research Institute, Chinese Academy of Sciences
Division of Physical Biology, CAS Key Laboratory of Interfacial Physics and Technology, Shanghai Institute of Applied Physics, Chinese Academy of Sciences