您当前的位置:
首页 >
文章列表页 >
Plasma characteristic of high voltage pulsed glow discharge and ion implantation for inner surface modification
更新时间:2021-03-12
    • Plasma characteristic of high voltage pulsed glow discharge and ion implantation for inner surface modification

    • NUCLEAR TECHNIQUES   Vol. 32, Issue 6, (2009)
    • CLC: TG174.44
    • Published:01 June 2009

    移动端阅览

  • LU Yang1 WANG Langping1 WANG Xiaofeng2 YU Yonghao1 HUANG Lei1 XIE Zhiwen1 1. Plasma characteristic of high voltage pulsed glow discharge and ion implantation for inner surface modification[J]. Nuclear techniques, 2009, 32(6): 431-434. DOI:

  •  
  •  

0

Views

23

下载量

0

CSCD

Alert me when the article has been cited
提交
Tools
Download
Export Citation
Share
Add to favorites
Add to my album

Related Articles

Dimension effects in plasma immersion ion implantation of cylindrical bore

Related Author

TIAN Xiubo KWOK Dixon T K TONG Honghui CHU Paul K
D T K Kwok
童洪辉
Paul K Chu

Related Institution

City University of Hong Kong
0