Proton beam writing(PBW) is a direct writing technique allowing the creation of three-dimensional structures with a high aspect ratio in the micrometer and nanometer range in photoresist materials without the use of a templates.On the scanning proton microprobe(SPM) at Shanghai Institute of Applied Physics

this technique was established recently.In this paper

progresses in this area of research are presented.PBW was successfully performed with the positive resist polymethyl methacrylate(PMMA).With the new scanning system being commissioned

a new scan program was developed and tested which is dedicated to the creation of arbitrarily shaped structures.