Nanocomposite nc-ZrCN/a-C:H(N) films were prepared on silicon substrates by filtered cathodic vacuum arc technique using the C2H2 and N2 gas as the precursor. The microstructure

composition and properties of the films were investigated by X-ray diffraction (XRD)

energy dispersive X-ray analysis (EDXA)

X-ray photoelectron spectroscopy (XPS)

high resolution scanning electron microscopy and nanoindenter. The results show that the film is composed of ZrCN and amorphous carbon. The Zr content of the films decreases with increasing flow rate of the C2H2/N2 gas mixture

and hardness of a film decreases with increased C and N contents in the film.