Small output and Gauss density distribution of metal plasmas at the exit of traditional filtered cathodic vacuum arc system become an obstacle of industrial application of plasma immersion ion implantation and deposition technology. Therefore

obtaining large area uniform metal plasmas is a focus of research. We have built a large area uniform metal plasmas system

with multi-cathodes installed symmetrically and a central solenoid. Metal plasmas output of 600 mm in diameter can be obtained. The results of deposition probe tests show that the presence of solenoid current has large influence on deposition uniformity. For a single source

the deposition uniformity in X-direction is better than that of Y-direction. With four sources

the ion current density is about 5.5 times more than that of a single source

and the maximum deposition uniformity is 83.8%.