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中国工程物理研究院激光聚变研究中心
Published:01 December 2009
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[1]易泰民,邢丕峰,李朝阳,谢军,郑凤成,李国荣.金属铀膜的制备及应用现状[J].核技术,2009,32(12):905-910.
YI Taimin XING Pifeng LI Chaoyang XIE Jun ZHENG Fengcheng LI Guorong. Progresses in uranium film fabrication and application[J]. Nuclear techniques, 2009, 32(12): 905-910.
介绍了国内外目前主要采用的制备金属铀膜的技术及各制备技术的应用现状
包括机械研磨、轧制、高真空蒸发沉积
脉冲激光气相沉积和溅射沉积
重点介绍了各种制备铀膜技术的工艺条件和制备出铀膜的厚度、表面质量、成分、晶粒结构以及其表征方法。以及薄膜沉积过程中生长速率和厚度监控的常用方法。
Techniques of preparing metal uranium films and their application were discussed
including mechanical polishing
mechanical rolling
evaporating in high vacuum
pulse laser deposition and magnetron sputtering deposition.Technological parameter and thickness
surface quality
composition
grain structures of the uranium films were discussed in detail.The monitors of the uranium film thickness and deposition rate were briefly introduced.
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