Investigation on synchrotron radiation lithography technology

CHEN Dapeng  YE Tianchun  XIE Changqing  LI Bing    DONG Lijun  XU Xingcai  ZHAO Lingli  HAN Jingdong

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Investigation on synchrotron radiation lithography technology

更新时间：2021-03-12

- Investigation on synchrotron radiation lithography technology
- NUCLEAR TECHNIQUES Issue 10, (2002)
- 作者机构：
  
  1. 中国科学院微电子中心
  2. 中国科学院高能物理研究所,北京,100010
  3. ,北京,100039
- 作者简介：
- 基金信息：
- DOI：
  CLC： TN405
- Published：01 October 2002
- 稿件说明：
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[1]陈大鹏,叶甜春,谢常青,李兵,董立军,胥兴才,赵玪莉,韩敬东,彭良强,伊福庭,韩勇,张菊芳.同步辐射光刻技术研究进展[J].核技术,2002(10):817-821.

CHEN Dapeng YE Tianchun XIE Changqing LI Bing DONG Lijun XU Xingcai ZHAO Lingli HAN Jingdong. Investigation on synchrotron radiation lithography technology[J]. Nuclear techniques, 2002, (10): 817-821.
[1]陈大鹏,叶甜春,谢常青,李兵,董立军,胥兴才,赵玪莉,韩敬东,彭良强,伊福庭,韩勇,张菊芳.同步辐射光刻技术研究进展[J].核技术,2002(10):817-821. DOI：

CHEN Dapeng YE Tianchun XIE Changqing LI Bing DONG Lijun XU Xingcai ZHAO Lingli HAN Jingdong. Investigation on synchrotron radiation lithography technology[J]. Nuclear techniques, 2002, (10): 817-821. DOI：

摘要

光刻技术是推动集成电路制造业不断向前发展的关键技术

X射线光刻技术是下一代光刻技术的一种

具有产业化的应用前景。掩模技术是X射线光刻技术的难点

本文报告了国内利用同步辐射源的X射线掩模和光刻技术研究的最新进展

Abstract

Lithography technique has been the key point to push forward the USL fabricator. X-ray lithography (XRL) is one of the next generation lithography techniques (NGL)

which has the probability of industrialization. The mask technique is the crux cell. This paper reports the latest development of XRL and mask fabricator technique in BSRF.

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Key technology of mask making for 50 nm X-ray lithography

Fabrication techniques of X-ray spiral zone plates

Synchrotron radiation X-ray lithography beamline design for 50nm resolution and below

Modern lithography techniques

Related Author

张菊芳

韩勇

彭良强

伊福廷

叶甜春

韩敬东

DONG Lijun CHEN Dapeng XIE Changqing HAN Jingdong YE Tianchun

陈大鹏

Related Institution

Microelectronics Research and Development Center, the Chinese Academy of Sciences, Beijing 100010) YI Futing PENG Liangqiang HAN Yong ZHANG Jufang

中国科学院高能物理研究所同步辐射实验室

Institute of Microelectronics,Chinese Academy of Sciences

Microelectronics R&D Center, the Chinese Academy of Sciences, Beijing 100010) YI Futing PENG Liangqiang HAN Yong ZHANG Jufang

Microelectronics Research and Development Center, the Chinese Academy of Sciences

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