Diamond-like carbon (DLC) films were prepared by inductively coupled plasma enhance chemical vapor deposition (ICPECVD). Optical emission spectroscopy (OES) was applied to the analysis of different radicals in the process. The deposition rate and microhardness of DLC films were tested. The result shows that more ionic hydrocarbon radicals exist in methane plasma which is excitated by inductively coupled plasma source

so the hard DLC films are formed. Both RF power and pressure have distinct influence on radical’s species and proportion in the DLC films deposition process

and the film’s quality is affected finally.