A radio frequency ion beam source with a 10cm×30cm rectangular cross-section beam is developed and tested. This source is designed to provide large cover area for ion beam etching and polishing. With a four grid extraction system

this source can operate in argon at beam energies from 100 eV to 1000 eV. When the RF power is about 900 W

beam currents can reach to 600 mA in argon. The beam current uniformity is better than ±6% along the major axis over 27 cm length at a distance 26 cm from the ion beam source.