Analysis of ion-irradiated carbon film on tungsten

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Analysis of ion-irradiated carbon film on tungsten

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- Analysis of ion-irradiated carbon film on tungsten
- NUCLEAR TECHNIQUES Issue 7, (2000)
- 作者机构：
  
  教育部辐射物理及技术重点实验室!四川大学原子核科学技术研究所成都,610064
- 作者简介：
- 基金信息：
  
  核工业总公司科技基金!H7196BY402
- DOI：
  CLC： O484
- Published：01 July 2000
- 稿件说明：
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[1]陈剑宣,汪德志,张海龙,黄宁康,郑振华.离子辐照钨基上碳薄膜微结构的分析[J].核技术,2000(07):503-508.

Analysis of ion-irradiated carbon film on tungsten[J]. Nuclear techniques, 2000, (7): 503-508.
[1]陈剑宣,汪德志,张海龙,黄宁康,郑振华.离子辐照钨基上碳薄膜微结构的分析[J].核技术,2000(07):503-508. DOI：

Analysis of ion-irradiated carbon film on tungsten[J]. Nuclear techniques, 2000, (7): 503-508. DOI：

摘要

对钨基材料表面上射频磁控溅射沉积的碳膜进行了氩离子和氮离子的辐照，并作了XRD及XPS的分析。分析结果表明，不同离子辐照引起碳膜微结构的变化亦不同。氮离子辐照不仅使碳膜元素与基体元素发生混合，而且导致碳膜发生相变，生成碳-钨化合物，如α－W2C、WCx，同时氮离子本身与钨反应生成氮-钨化合物，如α－WN。氮离子辐照使无定形的碳膜中的生成相发生晶化，晶化的碳-钨化合物相、氮-钨化合物相的含量随氮离子辐照剂量的增加而提高。氩离子辐照却无此诱发作用，但发现氩离子辐照可有效消除氧的污染。随着氩离子剂量的增加，碳膜中污染氧的含量也随之减少。同时对有关机理作了相应的探讨。

Abstract

Analyses with XRD and XPS were made for the r.f magnetron sputtering deposited carbon film on tungsten substrate before and after Ar and N ions irradiation.It is found that the microstructure of the carbon film depends on the bombarding ion species. The r.f magnetron sputtering deposited carbon films are amorphous. While the N ion irradiation can induce the formation of C-N and N-W crystalline compounds

the Ar ion irradiation can not induce such a phase transformation. But the latter can effectively reduce oxygen contamination. With increase of Ar ion doses

the content of the contaminating oxygen is decreased. The related mechanism was also discussed in the paper.

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