(LCMO) thin films with the thickness of 500 A were deposited on(001)-oriented single crystal SrTiO
3
(STO)
MgO and α-Al
2
O
3
(ALO) by 90° off-axis radio frequency magnetron sputtering. Grazing incidence X-ray diffraction technique
associated with normal X-ray diffraction
was adopted to measure the in-plane lattice parameter and investigate the lattice strain and strain relaxation in LCMO films. The results indicate that critical thickness of strain relaxation is very small
which may be related to large mismatch between film and substrate. The mechanism for strain relaxation in LCMO film is perhaps different from that for tetragonal distortion. Furthermore
the in-plane growth orientation of LCMO film on STO and MgO was also studied by grazing incidence X-ray diffraction and the result is consistent with that from transmission electron microscopy.